PDF) Metal-Ion Deposition from Ionized Magnetron Sputtering Discharge | Stephen Rossnagel - Academia.edu
PDF) Selective atomic layer etching of HfO2 over silicon by precursor and substrate-dependent selective deposition
History of the American Vacuum Society and the International Union for Vacuum Science, Technique, and Applications
Electrical optimization of plasma-enhanced chemical vapor deposition chamber cleaning plasmas
3.B An Interactive Information Management Data Base for Fusion Target Fabrication
PDF) Monte Carlo calculations of the beam flux distribution from molecular-beam epitaxy sources
Jeong's Website
HSQ - Nanolithography
Sol-gel synthesized indium tin oxide as a transparent conducting oxide with solution-processed black phosphorus for its integration into solar-cells - UNT Digital Library
TiN coating adhesion studies using the scratch test method
![PDF) Epitaxial growth of germanium on silicon using a Gd[sub 2]O[sub 3]/Si (111) crystalline template | O. Mauguin - Academia.edu](https://0.academia-photos.com/attachment_thumbnails/40502015/mini_magick20190220-21621-yxg0fg.png?1550733743 "PDF) Epitaxial growth of germanium on silicon using a Gd[sub 2]O[sub 3]/Si (111) crystalline template | O. Mauguin - Academia.edu")
PDF) Epitaxial growth of germanium on silicon using a Gd[sub 2]O[sub 3]/Si (111) crystalline template | O. Mauguin - Academia.edu
History of the American Vacuum Society and the International Union for Vacuum Science, Technique, and Applications
PDF) Significance of plasma-photoresist interactions for atomic layer etching processes with extreme ultraviolet photoresist
Meaglow News | Meaglow Hollow Cathode Plasma Sources
Effects of C4F8 plasma polymerization film on etching profiles in the Bosch process
Investigation of Structural and Optical Properties of Ag Nanoclusters Formed in Si(100) After Multiple Implantations of Low Energies Ag Ions and Post-Thermal Annealing at a Temperature Below the Ag-Si Eutectic Point -
Practical approach to modeling e-beam lithographic process from SEM images for minimization of line edge roughness and critical
The development of ultrahigh and extreme high vacuum technology for physics research
PPT - Plasma processes as advanced methods for cavity cleaning PowerPoint Presentation - ID:1748203
Strem Chemicals, Inc. strem.com
Anthony Muscat - Research
Investigation of the outgassing characteristics of the materials comprising a plasma display panel
Development of AlGaN-based graded-index-separate-confinement- heterostructure deep UV emitters by molecular beam epitaxy
